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LUDOX® PW-50 EC is an alkaline colloidal silica with low specific surface area. It is used as an abrasive in polishing slurries and as a surface modifier.
LUDOX® PW-50 EC is an alkaline, 50% solids, aqueous dispersion of silica. The silica is polydispersed and has an average particle size of 40 nanometers. The relatively large particle size, low surface area, and ultra high purity make LUDOX® PW-50 EC ideally suited for use as an abrasive in polishing applications.
Density (g/cm³, lb/gal): 1.4, 11.6.
Boiling Point (760 mm Hg) °C/°F: 100/212
Melting Point °C/°F: 0/32
Vapor Pressure (25°C) mm Hg: 24
Vapor Pressure (38°C) mm Hg: 48
Stabilizing Counter Ion: Sodium
Particle Charge: Negative
Primary Chemistry: Colloidal Silica
Anionic particles
Large particle size
Low surface area
Polydispersed particle size distribution
Optimal grade for polishing and surface modification
Damage to silicon wafers during polishing caused by the abrasive used in the polishing slurry.
LUDOX® PW-50 EC is the recommended colloidal silica grade for chemical-mechanical polishing slurries utilized in silicon wafer polishing.
LUDOX® PW-50 EC can be used as a frictionizing agent in anti-slip coatings for flooring, paper, and packaging applications.
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