Chemours Viton™ Fluoroelastomers play a pivotal role in enhancing the efficiency and reliability of semiconductor manufacturers operations. One key advantage of Viton™ Fluoroelastomers in semiconductor manufacturing is their resistance to a wide range of aggressive chemicals commonly used in the industry. The harsh chemical environments inherent in semiconductor wafer fabrication processes, such as etching, deposition, and cleaning, demand materials that can withstand prolonged exposure without compromising their structural integrity. Viton™ Fluoroelastomers excel in this regard, providing a reliable barrier against corrosive substances, thereby extending the lifespan of critical components and reducing maintenance requirements.
The superior thermal stability of Viton™ Fluoroelastomers is instrumental in semiconductor manufacturing operations with elevated temperatures. These elastomers can endure extreme heat conditions without undergoing significant degradation or loss of physical properties. This thermal resilience ensures the consistent performance of equipment and seals, contributing to the overall stability and repeatability in semiconductor fabrication.
Furthermore, the mechanical durability aspect offers molded FKM elastomers excellent tensile strength, tear resistance, and flexiblity in molded fluoroelastomer parts. These properties make Viton™ Fluoroelastomers ideal for use as seals, gaskets, O-rings and more in semiconductor equipment. This mechanical robustness enhances the reliability of sterile conditions, minimizing the risk of leaks and contamination that could adversely impact operations.
Viton™ Benefits for Semiconductor Fabrication
Below are some unique benefits that Viton™ fluorolastomers offer to both wet and dry semiconductor production processes in response to the industry's strict requirements.
Minimal metallic ion content
Contaminant elimination
Compatibility with a variety of rubber molding processes and intricate shapes
Chemical and plasma resistance
Superior reliability and repeatability
Low particle generation
High dimensional stability
Thermal stability
Low outgassing
Compression set resistance
Mechanical strength
Wide temperature range
Seal bonding integrity
Hydrophobic
Viton™ Application Mix
FKM Semiconductor Applications
Semiconductor wafer processing requires resistance to both wet and dry fabrication chemistries, such as etching, ashing, stripping, copper plating, and chemical vapor deposition.
Wet Process Applications
This process for semiconductor wafer manufacturing requires continued midrange operating temperatures with exposure to ultrapure deionized water and low levels of extractable total organic carbon.
FKM in Semiconductor Fabrication Wet Etch Processes
O-rings in the process chamber spinner
Chemical cabinet tank seals
Wet-station door gaskets
Filter cartridges PFA or FEP encapsulated FKM
Exhaust system diaphragms
Dry Process Fabrication
Between chemical and physical etching processes, dry processing removes selected areas from the surface layer and requires extreme operating reliability for semiconductor equipment components.
FKM in Semiconductor Fabrication Dry Processes
Chamber, gate, and valve seals
Exhaust sysemt
Vaccum seals
Piping seals
O-rings for vacuum pump
FKM in Auxiliary Processes
O-ring regulators
Pneumatic control equipment
Photoresistant manufacturing
In conclusion, the value properties of Viton™ Fluoroelastomers, encompassing chemical resistance, thermal stability, low outgassing, compression set resistance, mechanical strength, wide temperature range, and hydrophobicity, collectively contribute to their indispensable role in semiconductor manufacturing. These properties not only enhance the reliability and performance of critical components but also align with stringent demands for the semiconductor industry for precision, cleanliness, and efficiency.
Viton™ fluoroelastomers and any associated logo is a trademark or copyright of THE CHEMOURS COMPANY FC, LLC used with consent by ChemPoint, an authorized distributor of THE CHEMOURS COMPANY FC, LLC.
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