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LUDOX® PW-50 EC
LUDOX® PW-50 EC is an alkaline colloidal silica with low specific surface area. It is used as an abrasive in polishing slurries and as a surface modifier.
LUDOX® PW-50 EC is an alkaline, 50% solids, aqueous dispersion of silica. The silica is polydispersed and has an average particle size of 40 nanometers. The relatively large particle size, low surface area, and ultra high purity make LUDOX® PW-50 EC ideally suited for use as an abrasive in polishing applications.
Specifications
Density (g/cm³, lb/gal): 1.4, 11.6. Boiling Point (760 mm Hg) °C/°F: 100/212 Melting Point °C/°F: 0/32 Vapor Pressure (25°C) mm Hg: 24 Vapor Pressure (38°C) mm Hg: 48 Stabilizing Counter Ion: Sodium Particle Charge: Negative
Primary Chemistry: Colloidal Silica
Features & Benefits
Anionic particles Large particle size Low surface area Polydispersed particle size distribution Optimal grade for polishing and surface modification
Problems Solved
Damage to silicon wafers during polishing caused by the abrasive used in the polishing slurry.
Applications
LUDOX® PW-50 EC is the recommended colloidal silica grade for chemical-mechanical polishing slurries utilized in silicon wafer polishing.
LUDOX® PW-50 EC can be used as a frictionizing agent in anti-slip coatings for flooring, paper, and packaging applications.
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Thank you for your inquiry and interest in ChemPoint. We will respond to you shortly.
ChemPoint will not under any circumstances release personal user information to individuals or companies. All information collection is solely used to support ChemPoint customers service communications. Read our Privacy Notice.
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